The Largest Amount of Electronic Special Gas – Nitrogen Trifluoride NF3

Our country’s semiconductor industry and panel industry maintain a high level of prosperity. Nitrogen trifluoride, as an indispensable and largest-volume special electronic gas in the production and processing of panels and semiconductors, has a broad market space.

Commonly used fluorine-containing special electronic gases include sulfur hexafluoride (SF6), tungsten hexafluoride (WF6), carbon tetrafluoride (CF4), trifluoromethane (CHF3), nitrogen trifluoride (NF3), hexafluoroethane (C2F6) and octafluoropropane (C3F8). Nitrogen trifluoride (NF3) is mainly used as a fluorine source for hydrogen fluoride-fluoride gas high-energy chemical lasers. The effective part (about 25%) of the reaction energy between H2-O2 and F2 can be released by laser radiation, so HF-OF lasers are the most promising lasers among chemical lasers.

Nitrogen trifluoride is an excellent plasma etching gas in the microelectronics industry. For etching silicon and silicon nitride, nitrogen trifluoride has a higher etching rate and selectivity than carbon tetrafluoride and a mixture of carbon tetrafluoride and oxygen, and has no pollution to the surface. Especially in the etching of integrated circuit materials with a thickness of less than 1.5um, nitrogen trifluoride has a very excellent etching rate and selectivity, leaving no residue on the surface of the etched object, and is also a very good cleaning agent. With the development of nanotechnology and the large-scale development of the electronics industry, its demand will increase day by day.

As a type of fluorine-containing special gas, nitrogen trifluoride (NF3) is the largest electronic special gas product in the market. It is chemically inert at room temperature, more active than oxygen, more stable than fluorine, and easy to handle at high temperature.

Nitrogen trifluoride is mainly used as plasma etching gas and reaction chamber cleaning agent, suitable for manufacturing fields such as semiconductor chips, flat panel displays, optical fibers, photovoltaic cells, etc.

Compared with other fluorine-containing electronic gases, nitrogen trifluoride has the advantages of fast reaction and high efficiency, especially in the etching of silicon-containing materials such as silicon nitride, it has a high etching rate and selectivity, leaving no residue on the surface of the etched object, and is also a very good cleaning agent, and it is non-polluting to the surface and can meet the needs of the processing process.