Common fluorine-containing special electronic gases include sulfur hexafluoride (SF6), tungsten hexafluoride (WF6), carbon tetrafluoride (CF4), trifluoromethane (CHF3), nitrogen trifluoride (NF3), hexafluoroethane (C2F6) and octafluoropropane (C3F8).
With the development of nanotechnology and the large-scale development of the electronics industry, its demand will increase day by day. Nitrogen trifluoride, as an indispensable and largest-used special electronic gas in the production and processing of panels and semiconductors, has a broad market space.
As a type of fluorine-containing special gas, nitrogen trifluoride (NF3) is the electronic special gas product with the largest market capacity. It is chemically inert at room temperature, more active than oxygen at high temperature, more stable than fluorine, and easy to handle. Nitrogen trifluoride is mainly used as a plasma etching gas and a reaction chamber cleaning agent, and is suitable for the manufacturing fields of semiconductor chips, flat panel displays, optical fibers, photovoltaic cells, etc.
Compared with other fluorine-containing electronic gases, nitrogen trifluoride has the advantages of fast reaction and high efficiency. Especially in the etching of silicon-containing materials such as silicon nitride, it has a high etching rate and selectivity, leaving no residue on the surface of the etched object. It is also a very good cleaning agent and has no pollution to the surface, which can meet the needs of the processing process.
Post time: Sep-14-2024
